Smart way to determine and guarantee mask specifications - Trade-off between cost and quality

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Shigemitsu, Fumiaki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR BUDGETS; FIELD LEVEL; IMAGE PLACEMENTS; KEY FACTORS; LOW K1 LITHOGRAPHY; MASK COST; PROCESS PERFORMANCE; PRODUCTION YIELD; TECHNOLOGY NODES; WAFER FABRICATIONS;

BUDGET CONTROL; COBALT COMPOUNDS; COSTS; LITHOGRAPHY; PRODUCTION; TECHNOLOGY;

SPECIFICATIONS;

EID: 69949178258     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824270     Document Type: Conference Paper

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