Flexible mask specifications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 187-196

  Nojima, Shigeki ^a   Mimotogi, Shoji ^a   Itoh, Masamitsu ^a   Ikenaga, Osamu ^a   Hasebe, Shigeru ^a   Hashimoto, Kohji ^a   Inoue, Soichi ^a   Goto, Mineo ^a   Mori, Ichiro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Hot spot patterns; Lithography simulation; Mask specifications

Indexed keywords

COMPUTER SIMULATION; LITHOGRAPHY; SEMICONDUCTOR DEVICES;

MEMORY DEVICES;

MASKS;

EID: 0037966005     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.469361     Document Type: Article

References (1)

1. Junichiro Iba, Kohji Hashimoto, Richard A. Ferguson, Toshiaki Yanagisawa and Donald J. Samuels, "Electrical Characterization of Across-Field Lithographic Performance for 256M bit DRAM Technologies," Proc. SPIE Photomask and X-Ray Mask Technology II, Vol.2512, pp.218-225, 1995