Development of mask-DFM system "MiLE" load estimation of mask manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Nagamura, Yoshikazu ^a   Hosono, Kunihiro ^a   Narukawa, Shogo ^b   Mohri, Hiroshi ^b   Hayashi, Naoya ^b   Kato, Masahiro ^c   Kawase, Hidemichi ^c  

^a RENESAS TECHNOLOGY CORP   (Japan)

^b DAI NIPPON PRINTING CO LTD   (Japan)

^c Keirex Technology Inc

Author keywords

DFM; Manufacturability; MiLE; MRC; Shot; Workload estimation

Indexed keywords

DESIGN FOR MANUFACTURING (DFM); MANUFACTURABILITY; MASK RULE CHECKING (MRC); PHOTOMASK MANUFACTURING; WORKLOAD ESTIMATION;

DEFECTS; INSPECTION; PRODUCT DESIGN; SEMICONDUCTOR DEVICE MANUFACTURE; THREE DIMENSIONAL; WSI CIRCUITS;

MASKS;

EID: 42149117136     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746577     Document Type: Conference Paper

References (7)

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7. S. Narukawa, et. al., "Estimation of Shot Counts in VSB Writer using GDSII design data", Digest of papers Photomask Japan 2007, pp97-98, (2007).