Die-to-database mask inspection with variable sensitivity

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Tsuchiya, Hideo ^a   Tokita, Masakazu ^a   Nomura, Takehiko ^a   Inoue, Tadao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Design intent; Die to database; Inspection; Layout analysis; Mask data rank; OASIS; Review

Indexed keywords

EID: 45549098668     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793088     Document Type: Conference Paper

References (2)

1. Nobutaka Kikuiri, et al, "Development of Advanced Reticle Inspection Apparatus for hp 65 nm node device and beyond", Proc. SPIE, Vol.6283, 62830Y, (2006)
2. Takehiko Nomura, et al, "Specification and performance of the newly developed mask inspection system (NPI-5000)", Digest of Papers Photomask Japan 2007, p195 (2007)