Mask quality assurance in cleaning for haze elimination using flexible mask specifications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 1, 2007, Pages

  Otsubo, Kyo ^a   Yamaguchi, Shinji ^a   Arisawa, Yukiyasu ^a   Mukai, Hidefumi ^a   Kotani, Toshiya ^a   Mashita, Hiromitsu ^a   Hashimoto, Hiromitsu ^a   Kamo, Takashi ^a   Tsutsui, Tomohiro ^a   Ikenaga, Osamu ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Flexible mask specifications; Haze; Lithography margin; Number of cleaning; Quality assurance

Indexed keywords

OPACITY; PHASE SHIFT; QUALITY ASSURANCE; SEMICONDUCTOR DEVICE MANUFACTURE;

FLEXIBLE MASK SPECIFICATIONS; LITHOGRAPHY MARGIN; MASK QUALITY ASSURANCE; PHASE SHIFTING MASKS;

MASKS;

EID: 36248930914     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728921     Document Type: Conference Paper

References (3)

1. S. Nojima, S. Mimotogi, M. Itoh, O. Ikenaga, S. Hasebe, K. Hashimoto, S. Inoue, M. Goto and I. Mori, "Flexible mask specifications", Proc. of SPIE Vol. 4754, pp.33-42, 2002
2. M. Kariya, E. Yamanaka, S. Tanaka, T. Ikeda, S. Yamaguchi, K. Hashimoto, M. Itoh, H. Kobayashi, T. Kawashima and S. Narukawa, "Mask Pattern Quality Assurance based on Lithography Simulation with Fine Pixel SEM Image", Proc. of SPIE Vol. 5992, pp.59921M1-8, 2005
3. T. Kitamura, K. Kubota, T. Hasebe, F. Sakai, S. Nakazawa, N. Vohra, M. Yamamoto and M. Inoue, "Introduction of a Die-to-Database Verification Tool for the Entire Printed Geometry of a Die - Geometry Verification System NGR2100 for DFM", Proc. of SPIE Vol. 5853, pp.988-999