Structural defects and local chemistry across ferroelectric-electrode interfaces in epitaxial heterostructures

Journal of Materials Science

Volumn 44, Issue 19, 2009, Pages 5297-5306

  Arredondo, M ^a   Saunders, M ^b   Petraru, A ^c   Kohlstedt, H ^c   Vrejoiu, I ^d   Alexe, M ^d   Hesse, D ^d   Browning, N D ^e,f   Munroe, P ^a   Nagarajan, V ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

^d MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^e University of California   (United States)

^f LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMICALLY SHARP INTERFACE; BOTTOM ELECTRODES; CATION SPECIES; CHEMICAL GRADIENTS; DEFECT-FREE; DEPOSITION PROCESS; ELECTRODE INTERFACE; EPITAXIAL FERROELECTRIC; FERROELECTRIC SYSTEM; GROWTH INTERFACES; HETEROSTRUCTURES; INTER-DIFFUSION; SRTIO; STRUCTURAL DEFECT;

CRYSTALS; EPITAXIAL GROWTH; FERROELECTRIC DEVICES; FERROELECTRIC FILMS; FILM GROWTH; HETEROJUNCTIONS; LATTICE MISMATCH; LEAD; POSITIVE IONS; STRONTIUM ALLOYS; THIN FILM DEVICES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

FERROELECTRICITY;

EID: 68949166204     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-009-3548-y     Document Type: Article

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