Fluorine atom subsurface diffusion and reaction in photoresist

Journal of Applied Physics

Volumn 94, Issue 12, 2003, Pages 7453-7461

  Greer, Frank ^a   Fraser, D ^b   Coburn, J W ^b   Graves, David B ^b  

^a Novellus Systems   (United States)

^b University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DANGLING BONDS; QUARTZ-CRYSTAL MICROBALANCE (QCM); SUBSURFACE DIFFUSION;

CHEMICAL BONDS; COMPLEXATION; DEPOSITION; DIELECTRIC MATERIALS; DIFFUSION; ION BOMBARDMENT; LITHOGRAPHY; MOLECULAR BEAMS; PASSIVATION; PLASMA ETCHING; REACTION KINETICS; SILICON NITRIDE;

PHOTORESISTS;

EID: 0346305193     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1625782     Document Type: Article

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