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Volumn , Issue , 2008, Pages 99-115

Radiofrequency Plasma Sources for Semiconductor Processing

Author keywords

Capacitively coupled plasmas; Inductively coupled plasmas; Radiofrequency plasma sources; Semiconductor processing

Indexed keywords


EID: 67650308642     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9783527622184.ch6     Document Type: Chapter
Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.