Effects of multipolar magnetic fields on the characteristics of plasma and photoresist etching in an internal linear inductively coupled plasma system

Surface and Coatings Technology

Volumn 177-178, Issue , 2004, Pages 752-757

  Kim, K N ^a   Lee, Y J ^a   Kyong, S J ^a   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Inductively coupled plasma; Multipolar magnetic fields; R.f. antenna voltage

Indexed keywords

INDUCTIVELY COUPLED PLASMA; MAGNETIC FIELD EFFECTS; PHOTORESISTORS; PLASMA DENSITY; PLASMA ETCHING; PLASMA STABILITY; VOLTAGE MEASUREMENT;

MULTIPOLAR MAGNETIC FIELDS;

PLASMA SOURCES;

ETCHING;

EID: 1342268110     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.08.017     Document Type: Article

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