Characteristics of magnetized inductively coupled plasma source for flat panel display applications

Surface and Coatings Technology

Volumn 133-134, Issue , 2000, Pages 612-616

  Lee, Young Jun ^a   Han, Hye Rhee ^a   Yeom, Geun Young ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; DRY ETCHING; ELECTROMAGNETIC FIELD EFFECTS; FLAT PANEL DISPLAYS; MAGNETIZATION; PERMANENT MAGNETS; PLASMA DENSITY; PLASMA ETCHING; SILICON; SPUTTERING;

INDUCTIVELY COUPLED PLASMA;

PLASMA SOURCES;

EID: 19244370089     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00978-6     Document Type: Article

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