The characteristics of large area processing plasmas

IEEE Transactions on Plasma Science

Volumn 31, Issue 4 II, 2003, Pages 628-637

  Park, Sea Eun ^a   Cho, Byung Ug ^a   Lee, Jae Koo ^a   Lee, Young Joon ^b   Yeom, Geun Young ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

Embedded antenna coil; Inductively coupled plasma source; Large area plasma source

Indexed keywords

COMPUTER SIMULATION; ELECTRIC COILS; ELECTRIC DISCHARGES; ELECTRON TRANSPORT PROPERTIES; FINITE DIFFERENCE METHOD; MICROWAVE ANTENNAS; PLASMA DENSITY; PLASMA SIMULATION;

PLASMA DISCHARGES;

INDUCTIVELY COUPLED PLASMA;

EID: 0041927820     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2003.815247     Document Type: Article

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