SCOPUS 정보 검색 플랫폼

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 2, 2009, Pages 769-773

Measurement of surface adhesion force of adhesion promoter and release layer for UV-nanoimprint lithography

(6) Choi, Dae Geun a Lee, Dong II a Kim, Ki Don a Jeong, Jun Ho a Choi, Jun Hyuk a Lee, Eung Sug a

a Korea Institute of Machine and Materials (South Korea)

Author keywords

Measurement of adhesion force; Nanoimprint; Self Assembled monolayers (SAMs)

Indexed keywords

3-GLYCIDOXYPROPYLTRIMETHOXYSILANE; ACRYLATE RESIN; ADHESION FORCES; ADHESION PROMOTER; AMINOPROPYL; COVALENT BONDING; DICHLOROSILANE; INSTRON; NANOIMPRINT; OXYGEN PLASMA TREATMENTS; RELEASE LAYER; SAMS; SELF-ASSEMBLED MONOLAYERS (SAMS); SEPARATION FORCE; SILICON SUBSTRATES; SURFACE ADHESION; TRICHLOROSILANE; TRIETHOXYSILANE; UV CURABLE; UV NANOIMPRINT LITHOGRAPHY; VAPOR DEPOSITION METHOD;

ADHESION; CURING; LEAKAGE (FLUID); NANOIMPRINT LITHOGRAPHY; OXYGEN; PLASMA DEPOSITION; RESINS; SILANES; SURFACE TREATMENT;

SELF ASSEMBLED MONOLAYERS;

EID: 67649289499 PISSN: 15334880 EISSN: None Source Type: Journal
DOI: 10.1166/jnn.2009.C021 Document Type: Conference Paper

Times cited : (13)

References (11)

1
- 0030570065
- S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Science 272, 85 (1996).
- (1996) Science , vol.272 , pp. 85
- Chou, S.Y.¹ Krauss, P.R.² Renstrom, P.J.³

2
- 5344241941
- S. Y. Chou, P. R. Krauss, and P. J. Renstrom, J. Vac. Sci. Technol. B 14, 4129 (1996).
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 4129
- Chou, S.Y.¹ Krauss, P.R.² Renstrom, P.J.³

3
- 5344268855
- J. Haisma, M. Verheijen, K. Van Den Heuvel, and J. Van Den Berg, J. Vac. Sci. Technol. B 14, 4124 (1996).
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 4124
- Haisma, J.¹ Verheijen, M.² Van Den Heuvel, K.³ Van Den Berg, J.⁴

4
- 12444274893
- D. J. Resnick, S. V. Sreenivasan, and C. G. Willson, Mater Today 8, 34 (2005).
- (2005) Mater Today , vol.8 , pp. 34
- Resnick, D.J.¹ Sreenivasan, S.V.² Willson, C.G.³

5
- 3242676271
- M. D. Austin, H. Ge, W. Wu, M. Li, Z. Yu, D. Wasserman, S. A. Lyon, and S. Y. Chou, Appl. Phys. Lett. 84, 5299 (2006).
- (2006) Appl. Phys. Lett , vol.84 , pp. 5299
- Austin, M.D.¹ Ge, H.² Wu, W.³ Li, M.⁴ Yu, Z.⁵ Wasserman, D.⁶ Lyon, S.A.⁷ Chou, S.Y.⁸

6
- 27144465249
- D. G. Choi, J. H. Jeong, Y. S. Sim, E. S. Lee, W. S. Kim, and B. S. Bae, Langmuir 21, 9390 (2005).
- (2005) Langmuir , vol.21 , pp. 9390
- Choi, D.G.¹ Jeong, J.H.² Sim, Y.S.³ Lee, E.S.⁴ Kim, W.S.⁵ Bae, B.S.⁶

7
- 0034316495
- T. Bailey, B. J. Choi, M. Colburn, M. Meissl, S. Shaya, J. G. Ekerdt, S. V. Sreenivasan, and C. G. Willson, J. Vac. Sci. Technol. B 18, 3572 (2000).
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 3572
- Bailey, T.¹ Choi, B.J.² Colburn, M.³ Meissl, M.⁴ Shaya, S.⁵ Ekerdt, J.G.⁶ Sreenivasan, S.V.⁷ Willson, C.G.⁸

8
- 0038930698
- P. Ruchhoeft, M. Colburn, B. Choi, H. Nounu, S. Johnson, T. Bailey, S. Damle, and C. G. Wilison, J. Vac. Sci. Technol. B 17, 2965 (1999).
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 2965
- Ruchhoeft, P.¹ Colburn, M.² Choi, B.³ Nounu, H.⁴ Johnson, S.⁵ Bailey, T.⁶ Damle, S.⁷ Wilison, C.G.⁸

9
- 33746626110
- W. S. Kim, J. H. Jin, and B. S. Bae, Nanotechnology 17, 3319 (2006).
- (2006) Nanotechnology , vol.17 , pp. 3319
- Kim, W.S.¹ Jin, J.H.² Bae, B.S.³

10
- 57649105080
- H. J. Lee, S. M. Hyun, H. J. Lee, D.-G. Choi, D.-I. Lee, and E. S. Lee, Adv. Mater Res. 26, 1113 (2007).
- (2007) Adv. Mater Res , vol.26 , pp. 1113
- Lee, H.J.¹ Hyun, S.M.² Lee, H.J.³ Choi, D.-G.⁴ Lee, D.-I.⁵ Lee, E.S.⁶

11
- 84857900198
- http://www.gelest.comlcompany/pdfs/couplingagents.pdf.

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