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Volumn 140, Issue 1, 2009, Pages 65-72

Room temperature metal-insulator-semiconductor (MIS) hydrogen sensors based on chemically surface modified porous silicon

Author keywords

MIS hydrogen sensor; Noble metals; Porous silicon; Stability; Surface modification

Indexed keywords

CHEMICAL METHOD; CONSISTENT PERFORMANCE; ELECTROCHEMICAL ANODIZATION; ELECTROLESS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GRAZING-INCIDENCE X-RAY DIFFRACTION; HYDROGEN SENSOR; METAL-INSULATOR-SEMICONDUCTOR; MIS HYDROGEN SENSOR; MIS STRUCTURE; MODIFIED SURFACES; NOBLE METALS; OHMIC CONTACT FORMATION; RECOVERY TIME; RESPONSE TIME; ROOM TEMPERATURE; SURFACE MODIFICATION; SURFACE STATE; SURFACE-MODIFIED; TRANSIENT RESPONSE;

EID: 67349217423     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2009.04.013     Document Type: Article
Times cited : (34)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.