Selective H atom sensors using ultrathin Ag/Si Schottky diodes

Applied Physics Letters

Volumn 74, Issue 26, 1999, Pages 4046-4048

  Nienhaus, Hermann ^a   Bergh, Howard S ^b   Gergen, Brian ^b   Majumdar, Arun ^c   Weinberg, W Henry ^b   McFarland, Eric W ^b  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b University of California at Santa Barbara   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANNEALING; CHEMICAL SENSORS; HYDROGEN; ION IMPLANTATION; LOW ENERGY ELECTRON DIFFRACTION; OHMIC CONTACTS; PHOTODISSOCIATION; SENSITIVITY ANALYSIS; SILICON WAFERS; SILVER; ULTRATHIN FILMS;

CHEMICURRENTS; EXOTHERMIC ADSORPTION; PHOTOEXCITATIONS;

SCHOTTKY BARRIER DIODES;

EID: 0032620314     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123256     Document Type: Article

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