Plasmon loss and valence band structure of silicon-based alloys deposited by hot wire chemical vapor deposition

Journal of Alloys and Compounds

Volumn 480, Issue 2, 2009, Pages 878-881

  Swain, Bibhu P ^a   Swain, Bhabani S ^a   Park, Sung H ^a   Hwang, Nong M ^a  

^a Seoul National University   (South Korea)

Author keywords

HWCVD; Silicon based alloys; XPS

Indexed keywords

A-SIC:H; A-SIN:H; CARBON AND NITROGEN; HOT WIRE CHEMICAL VAPOR DEPOSITION; HWCVD; NC-SI:H; PLASMON LOSS; SILICON-BASED; SILICON-BASED ALLOYS; XPS;

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; GAS MIXTURES; METALLIC FILMS; PLASMONS; SILICON ALLOYS; SILICON CARBIDE; SILICON NITRIDE; VAPORS; WIRE; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 67349189941     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.02.057     Document Type: Article

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