The analysis of structural and electronic environments of silicon network in HWCVD deposited a-SiC:H films

Applied Surface Science

Volumn 253, Issue 21, 2007, Pages 8695-8698

  Swain, Bibhu P ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

Author keywords

HWCVD; Plasmon energy; Raman and XPS; Valence band

Indexed keywords

AMORPHOUS ALLOYS; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; RAMAN SPECTROSCOPY; SILICON ALLOYS; X RAY PHOTOELECTRON SPECTROSCOPY;

HOT WIRE CHEMICAL VAPOUR DEPOSITION (HWCVD); PLASMON ENERGY; SILICON NETWORK; VALENCE BAND;

THIN FILMS;

EID: 34547143153     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.04.065     Document Type: Article

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