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Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 320-329

Application of hot-wire chemical vapor-deposited Si:H films in thin film transistors and solar cells

(5) Rath, Jatindra K a Stannowski, Bernd a Van Veenendaal, Patrick A T T a Van Veen, Marieke K a Schropp, Ruud E I a

a UTRECHT UNIVERSITY (Netherlands)

Author keywords

Hot wire chemical vapor deposition; Silicon; Solar cell; Thin film transistor; Tungsten

Indexed keywords

AMORPHOUS SILICON; ANTIFERROMAGNETISM; CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; DIFFUSION; DIMERS; GRAIN BOUNDARIES; PASSIVATION; POLYSILICON; SILICON NITRIDE; SOLAR ENERGY; THIN FILM TRANSISTORS;

HOT WIRE DEPOSITION; TANDEM CELLS;

SEMICONDUCTING FILMS;

EID: 0035800995 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01288-3 Document Type: Conference Paper

Times cited : (23)

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