CD bias reduction in CD-SEM linewidth measurements for advanced lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6922, Issue , 2008, Pages

  Tanaka, Maki ^a   Meessen, Jeroen ^b   Shishido, Chie ^a   Watanabe, Kenji ^c   Minnaert Janssen, Ingrid ^b   Vanoppen, Peter ^b  

^a HITACHI LTD   (Japan)

^b ASML   (Netherlands)

^c HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

Advanced lithography; AFM; CD SEM; Electron beam calibration; Measurement bias; Model based library; Monte Carlo simulation

Indexed keywords

ADVANCED LITHOGRAPHY; AFM; CD-SEM; MEASUREMENT BIAS; MODEL-BASED LIBRARY; MONTE CARLO SIMULATION;

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; ELECTRON BEAMS; ESTIMATION; LEAST SQUARES APPROXIMATIONS; LINEWIDTH; MEASUREMENTS; MONTE CARLO METHODS; PARAMETER ESTIMATION; PROCESS CONTROL; SENSITIVITY ANALYSIS; UNITS OF MEASUREMENT;

LITHOGRAPHY;

EID: 66649125374     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772088     Document Type: Conference Paper

References (10)

1. M. P. Davidson and A. E. Vladár, "An inverse scattering approach to SEM line width measurement, " Proceedings of the SPIE, Vol. 3677, pp. 640-649, 1999.
2. J. S. Villarrubia, A. E. Vladár, J. R. Lowney, and M. T. Postek, "Edge Determination for Poly-crystalline Silicon Lines on Gate Oxide, " Proceedings of the SPIE, Vol. 4344, pp. 147-156, 2001. (Pubitemid 32993499)
3. J. S. Villarrubia, A. E. Vladár, J. R. Lowney, and M. T. Postek, "Scanning electron microscope analog of scatterometry, " Proceedings of the SPIE, Vol. 4689, pp. 304-312, 2002. (Pubitemid 35250724)
4. J. S. Villarrubia, A. E. Vladár, and M. T. Postek, "Simulation study of repeatability and bias in the critical dimension scanning electron microscope, " Journal of Microlithography, Microfabrication, and Microsystems, Vol. 4(3), pp. 0330021-10, 2005.
5. M. Tanaka, J. S. Villarrubia, and A. E. Vladár, "Influence of Focus Variation on Linewidth Measurements, " Proceedings of the SPIE, Vol. 5752, pp. 144-155, 2005. (Pubitemid 41275265)
6. M. Tanaka, C. Shishido, and H. Kawada, "Influence of electron incident angle distribution on CD-SEM linewidth measurements, " Proceedings of the SPIE, Vol. 6152, 61523Z, 2006.
7. M. Tanaka, C. Shishido, W. Nagatomo, and K. Watanabe, "CD-bias evaluation and reduction in CD-SEM linewidth measurements, " Proceedings of the SPIE, Vol. 6518, pp. 651848, 2007.
8. A. Yamaguchi, H. Fukuda, H. Kawada, and T. Iizumi, "Impact on long-period line-edge roughness (LER) on accuracy in critical dimension (CD) measurement and new guideline for CD metrology, " Jpn. J. Appl. Phys., Vol. 44, No. 7B, 2005, pp. 5575-5580, 2005. (Pubitemid 43182961)
9. M. Edamura, Y. Kunimoto, T. Morimoto, S. Sekino, T. Kurenuma, Y. Kenbo, M. Watanabe, S. Baba, and K. Hidaka, "New Inline AFM Metrology Tool Suited for LSI Manufacturing at the 45-nm Node and Beyond, " Proceedings of the SPIE, Vol. 6518, pp. 65183M, 2007.
10. M. Watanabe, S. Baba, T. Morimoto, and S. Sekino, "A novel AFM method for sidewall measurement of highaspect ratio patterns, " Proceedings of the SPIE, Vol. 6922-18, 2008.