Double patterning in lithography for 65nm node with oxidation process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Jeong, Eunsoo ^a   Kim, Jeahee ^a   Choi, Kwangsun ^a   Lee, Minkon ^a   Lee, Doosung ^a   Kim, Myungsoo ^a   Park, Chansik ^a  

^a Dongbu HiTek Co Ltd   (South Korea)

Author keywords

Double exposure technique; Double patterning; Enhancement; Photolithography; Resolution

Indexed keywords

MICROFLUIDICS; OPTICS; PHOTOLITHOGRAPHY; SODIUM;

65-NM NODES; DOUBLE PATTERNING; EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL); FEATURE SIZES; HIGH NA; IN ORDER; NEXT-GENERATION LITHOGRAPHY (NGL); OPTICAL LITHOGRAPHY; OPTICAL MICRO LITHOGRAPHY; OXIDATION PROCESSES;

ELECTRON BEAM LITHOGRAPHY;

EID: 45449085022     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772544     Document Type: Conference Paper

References (5)

1. Noreen Harned, Cristian Wagner, "A New Era in Lithography", SEMI Technology Symposium, pp129, (2004)
2. Shu-Hao Hsu*, Shu-Ping Fang, "Extension of ArF Lithography for Poly Gate Patterning of 65nm Generation and Beyond", Proc. of SPIE Vol. 5377, 1214, (2004)
3. Steven R. J. Brueck, Abani M. Biswas, "Experimental verification of a model based decomposition method for Double Dipole Lithography", Proc. of SPIE Vol. 5377, 1225, (2004)
4. Giuseppe Y. Mark, Alfred K. Wong, Edmund Y. Lam, "Alternating phase-shifting mask design for low aberration Sensitivity", Proc. of SPIE VOL. 5377, 591(2004)
5. Sang-Jin Kim, Process Development Team, Semiconductor R&D Center, Samsung Electronics, "Era of Double Exposure in 70 nm Node DRAM Cell" , Proc. of SPIE VOL. 5754, 0277 (2005)