Double patterning for 32nm and below: An update

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Finders, Jo ^a   Dusa, Mircea ^b   Vleeming, Bert ^a   Megens, Henry ^a   Hepp, Birgitt ^a   Maenhoudt, Mireille ^c   Cheng, Shaunee ^c   Vandeweyer, Tom ^c  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

^c IMEC   (Belgium)

Author keywords

DoseMapper; Double patterning lithography; DPL; Gridmapper; LELE; Line space CDU populations; Spacer self aligned; XT: 1900i; XT:1700i

Indexed keywords

BUDGET CONTROL; CADMIUM; CADMIUM COMPOUNDS; COMPUTER NETWORKS; CONTROL THEORY; CRACK DETECTION; DATA STORAGE EQUIPMENT; IMAGE SEGMENTATION; LITHOGRAPHY; NANOTECHNOLOGY; PRODUCTION CONTROL; SODIUM; TECHNOLOGY;

(2+1)-DIMENSIONAL; (ALGORITHMIC) COMPLEXITY; (E ,3E) PROCESS; CROSS DIRECTIONAL (CD) CONTROL; DOUBLE PATTERNING; EXPERIMENTAL RESULTS; FULL-FIELD; HYPER-NA; IMMERSION SCANNERS; IN ORDER; INTRA FIELD; OPTICAL MICRO LITHOGRAPHY; OVERLAY CONTROL; SACRIFICIAL LAYERS; SINGLE EXPOSURE; SPACER LAYERS; SPATIAL DISTRIBUTIONS; UNCORRELATED;

POPULATION STATISTICS;

EID: 45449112590     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772780     Document Type: Conference Paper

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