Study of defects and thermal stability of ultrathin Cu films on Ta(110) and Ta(100) by thermal helium desorption spectrometry

Thin Solid Films

Volumn 517, Issue 18, 2009, Pages 5482-5488

  Venugopal, V ^a   Thijsse, B J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Copper; Tantalum; Thermal helium desorption spectrometry (THDS); Thermal stability; Vacancies

Indexed keywords

CU FILMS; ELECTRON BEAM EVAPORATION; HELIUM RELEASE; ISLAND FORMATION; KISSINGER ANALYSIS; MONOVACANCIES; ROOM TEMPERATURE; STRESSED STATE; SUBSTRATE ORIENTATION; THERMAL HELIUM DESORPTION SPECTROMETRIES; THERMAL HELIUM DESORPTION SPECTROMETRY (THDS); THERMAL STABILITY; ULTRA-THIN; VACANCY CLUSTER;

ACTIVATION ANALYSIS; ACTIVATION ENERGY; DESORPTION; ELECTRON BEAMS; HELIUM; METALLIC FILMS; RADIOACTIVITY; SINGLE CRYSTALS; SPECTROMETERS; SPECTROMETRY; SUBSTRATES; TANTALUM; THERMAL EVAPORATION; THERMODYNAMIC STABILITY; ULTRATHIN FILMS; VACANCIES; VACUUM; VACUUM EVAPORATION;

COPPER;

EID: 65649152399     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.108     Document Type: Article

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