Molecular dynamics Simulations of Cu/Ta and Ta/Cu thin film growth

Journal of Computer-Aided Materials Design

Volumn 10, Issue 2, 2003, Pages 61-74

  Klaver, T P C ^a   Thijsse, B J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Copper; Deposition; Simulation; Tantalum; Thin film

Indexed keywords

COMPUTER SIMULATION; COPPER; CRYSTAL STRUCTURE; DEPOSITION; DISLOCATIONS (CRYSTALS); FILM GROWTH; MOLECULAR DYNAMICS; TANTALUM;

BCC SUBSTRATE; ELECTROMIGRATION RESISTANCE; FCC FILM; SILICON OXIDE;

THIN FILMS;

EID: 9644294250     PISSN: 09281045     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JCAD.0000036802.46424.ee     Document Type: Review

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