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Journal of Materials Science

Volumn 37, Issue 10, 2002, Pages 1941-1949

Behaviour of ionized metal plasma deposited Ta diffusion barrier between Cu and SiO2

(7) Maung Latt, Khin a Park, H S a Li, S a Rong, Liu b Osipowicz, T b Zhu, W G c Lee, Y K a

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

c NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DIFFUSION; ELECTRIC RESISTANCE MEASUREMENT; GRAIN SIZE AND SHAPE; IONIZATION; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON COMPOUNDS; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DIFFUSION BARRIER; IONIZED METAL PLASMA SPUTTERING;

TANTALUM;

EID: 0037094401 PISSN: 00222461 EISSN: None Source Type: Journal
DOI: 10.1023/A:1015230727381 Document Type: Article

Times cited : (13)

References (32)

1
- 0024735644
- (1989) IEEE Electron Device Lett. , vol.10 , pp. 423
- Pai, P.L.¹ Ting, C.H.²

2
- 0001272630
- (1990) J. Appl. Phys. , vol.67 , pp. 556
- Chang, C.A.¹

3
- 0030212480
- (1991) J. Mater. Sci: Mater. Electron. Soc. , vol.7 , pp. 271
- Jang, S.Y.¹ Lee, S.M.² Baik, H.K.³

4
- 0000560069
- (1990) J. Appl. Phys. , vol.67 , pp. 6184
- Chang, C.A.¹

5
- 36549092310
- (1990) J. Appl. Phys. , vol.68 , pp. 5176
- Wang, S.Q.¹ Raaijmakers, I.² Burrow, B.J.³ Suther, S.⁴ Redkar, S.⁵ Kim, K.B.⁶

6
- 0008988230
- (1992) J. Appl. Phys. , vol.71 , pp. 5433
- Holloway, K.¹ Fryer, P.M.² Cabral C., Jr.³ Harper, J.M.E.⁴ Bailey, P.J.⁵ Kelleher, K.H.⁶

7
- 36449007074
- (1993) J. Appl. Phys. , vol.73 , pp. 2301
- Wang, S.Q.¹ Suther, S.² Burrow, B.J.³ Hoeflich, C.⁴

8
- 0026202373
- (1991) Thin Solid Films , vol.203 , pp. 259
- Pokela, P.J.¹ Kolawa, E.² Ruiz, R.P.³ Nicolet, M.A.⁴

9
- 0003689862
- (ASM/NIST, Metals Park, OH)
- (1986) Binary Alloy Phase Diagrams, 2nd Ed.
- Massalski, T.B.¹

10
- 0004329417
- Properties of metal silicides
- (INSPEC, London)
- (1995) EMIS Data Reviews Series No. 14
- Maex, K.¹ Rossum, M.V.²

11
- 36449002563
- (1993) J. Appl. Phys. , vol.73 , pp. 300
- Clevenger, L.A.¹ Bojarczuk, N.A.² Holloway, K.³ Harper, J.M.E.⁴ Cabral C., Jr.⁵ Schad, R.G.⁶ Cardone, F.⁷ Stolt, L.⁸

12
- 0030212480
- (1996) J. Mater. Sci. , vol.7 , pp. 271
- Jang, S.-Y.¹ Lee, S.-M.² Baik, H.-K.³

13
- 0009363075
- (1997) J. Electrochem. Soc. , vol.144 , pp. 807
- Kang, B.-S.¹ Lee, S.-M.² Kwak, J.S.³ Yoon, D.-S.⁴ Baik, H.K.⁵

14
- 0000244294
- (1994) J. Vac. Sci. Technol. B , vol.12 , pp. 499
- Rossnagel, S.M.¹ Hopwood, J.²

15
- 0000846789
- (1992) J. Appl. Phys. , vol.72 , pp. 4918
- Clevenger, L.A.¹ Mutscheller, A.² Harper, J.M.E.³ Cabral C., Jr.⁴ Barmak, K.⁵

16
- 0033336963
- (1999) Acta Mater. , vol.47 , Issue.15 , pp. 3965
- Lee, H.-J.¹ Kwon, K.W.² Ryu, C.³ Scinlair, R.⁴

17
- 0001348976
- (1973) Acta Crystallogr., Sect. B: Structure, Crystallogr. Cryst. Chem. , vol.29 , pp. 1170
- Moseley, P.T.¹ Seabrook, C.J.²

18
- 0015627916
- (1973) Thin Solid Film , vol.16 , pp. 129
- Feinstein, L.G.¹ Huttemann, R.D.²

19
- 0001559994
- (2000) J. Appl. Phys. , vol.88 , pp. 3377
- Laurila, T.¹ Zeng, K.² Kivilahti, J.K.³

20
- 36449004557
- (1991) J. Appl. Phys. , vol.70 , pp. 2820
- Li, J.¹ Mayer, J.W.² Colgan, E.G.³

21
- 0015326625
- (1972) Thin Solid Film , vol.10 , pp. 123
- Read, M.H.¹ Hensler, D.H.²

22
- 0033990021
- (2000) J. Mater. Res. , vol.15 , Issue.1 , pp. 203
- Lane, M.¹ Dauskardt, R.H.² Krishna, N.³ Hashim, I.⁴

23
- 36449001157
- (1991) J. Appl. Phys. , vol.69 , pp. 2161
- Chen, J.¹ Chen, L.²

24
- 0027259825
- (1993) Scripta Mater. Sci. , vol.28 , pp. 167
- Thompson, C.V.¹

25
- 36449005343
- (1994) J. Appl. Phys. , vol.76 , pp. 4516
- Zielinski, E.Z.¹ Vinci, R.P.² Bravman, J.C.³

26
- 11944275568
- (1990) Annu. Rev. Mater. Sci. , vol.20 , pp. 245
- Thompson, C.V.¹

27
- 0001581789
- (1992) Mater. Sci. Forum , vol.94-96 , pp. 543
- Frost, H.J.¹ Thompson, C.V.² Walton, D.T.³

28
- 0000333346
- (1990) J. Vac. Technol. , vol.9 , pp. 520
- Chaudhari, P.¹

29
- 0000064496
- (1997) Mater. Res. Soc. Symp. Proc. , vol.436 , pp. 221
- Keller, R.-M.¹ Sigel, W.² Baker, S.P.³ Kraft, O.⁴ Arzt, E.⁵

30
- 0001724595
- (1994) Proc. R. Soc. London A , vol.225 , pp. 548
- Halliday, J.S.¹ Rymer, T.B.² Wright, K.H.R.³

31
- 0025251414
- (1990) J. Mater. Res. , vol.5 , pp. 151
- Miller, K.T.¹ Lange, F.F.² Marshall, D.B.³

32
- 0033900789
- (2000) Thin Solid Film , vol.359 , pp. 261
- Lee, S.-Y.¹ Choi, S.-H.² Park, C.-O.³

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