Negative corona discharge: Application to nanoparticle detection in rf reactors

Plasma Sources Science and Technology

Volumn 18, Issue 1, 2009, Pages

  Abolmasov, S N ^a   Kroely, L ^a   Roca I Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED PLASMAS; DISCHARGE MODES; EMISSIVE PROBES; FILAMENT TEMPERATURES; NEGATIVE CORONAS; NEGATIVE POTENTIALS; POSITIVELY CHARGED; POST PLASMAS; RF REACTORS; RF-POWER; SILICON NANOPARTICLES; STABLE OPERATIONS; SURFACE CONTAMINATIONS; THERMOPHORETIC FORCES; TUNGSTEN FILAMENTS;

ARGON; ELECTRIC CORONA; FILAMENTS (LAMP); GAS DISCHARGE TUBES; GLOW DISCHARGES; HYDROGEN; INDUCTIVELY COUPLED PLASMA; NANOPARTICLES; PROBES; SILANES; TUNGSTEN;

COUPLED CIRCUITS;

EID: 65549085302     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/18/1/015005     Document Type: Article

References (34)

1. Hollenstein Ch 2000 Plasma Phys. Control. Fusion 42 R93
2. Boufendi L and Bouchoule A 2002 Plasma Sources Sci. Technol. 11 A211
3. Graves D B 1994 IEEE Trans. Plasma Sci. 22 31
4. Roca i Cabarrocas P, Chaâbane N, Kharchenko A V and Tchakarov S 2004 Plasma Phys. Control. Fusion 46 B235
5. Kortshagen U, Mangolini L and Bapat A 2007 J. Nanopart. Res. 9 39
6. Roth R M, Spears K G, Stein G D and Wong G 1985 Appl. Phys. Lett. 46 253
7. Watanabe Y, Shiratani M and Yamashita M 1992 Appl. Phys. Lett. 61 1510
8. Shiratani M, Kawasaki H, Fukuzawa T and Watanabe Y 1996 J. Vac. Sci. Technol. 14 603
9. Ghidini R, Groothuis C H J M, Sorokin M, Kroesen G M W and Stoffels W W 2004 Plasma Sources Sci. Technol. 33 143
10. Stoffels W W, Stoffels E, Kroesen G M W and Dehoog F J 1993 J. Appl. Phys. 74 2959
11. Boufendi L, Hermann J, Bouchoule A, Dubreuil B, Stoffels E, Stoffels W W and Degiogi M L 1994 J. Appl. Phys. 76 148
12. Boufendi L, Plain A, Blondeau J P, Bouchoule A, Laure C and Toogood M 1992 Appl. Phys. Lett. 60 169
13. Kawasaki H, Kida J, Sakamoto K, Fukuzawa T, Shiratani M and Watanabe Y 1998 J. Appl. Phys. 83 5665
14. Shen Z, Kim T, Kortshagen U, McMurry P H and Campbell S A 2003 J. Appl. Phys. 94 2277
15. Boufendi L, Gaudin J, Huet S, Viera G and Dudemaine M 2001 Appl. Phys. Lett. 79 4301
16. Fukuzawa T, Obata K, Kawasaki H, Shiratani M and Watanabe Y 1996 J. Appl. Phys. 80 3202
17. Stoffels E, Stoffels W W, Kroesen G M W and deHoog F J 1996 J. Vac. Sci. Technol. A 14 556
18. Carlile R N, Gena S, O'Hanlon J F and Stewart J C 1991 J. Appl. Phys. 59 1167
19. Collins S M, O'Hanlon J F, Carlile R N and Hong L M 1993 J. Vac. Sci. Technol. A 11 1
20. Kang J, Carlile R N, O'Hanlon J F and Collins S M 1996 J. Vac. Sci. Technol. A 14 639
21. Nguyen-Tran Th, Roca i Cabarrocas P and Patriarche G 2007 Appl. Phys. Lett. 91 111501
22. Mahan A H 2003 Sol. Energy Mater. Sol. Cells 78 299
23. Abolmasov S N, Kroely L and Roca i Cabarrocas P 2008 J. Phys. D: Appl. Phys. 41 165203
24. Trichel G W 1938 Phys. Rev. 54 1078
25. Cicala G, Shakhatov V A, De Pascale O, Capezzuto P and Bruno G 1999 Plasma Sources Sci. Technol. 8 279
26. McCaughey M J and Kushner M J 1991 J. Appl. Phys. 69 6952
27. Choi S J, McCaughey M J, Sommerer T J and Kushner M J 1991 Appl. Phys. Lett. 59 3102
28. Collins S M, Brown D A, O'Hanlon J F and Carlile R N 1996 J. Vac. Sci. Technol. A 14 634
29. Gorla C R, Liang S, Tompa G S, Mayo W E and Lu Y 1997 J. Vac. Sci. Technol. A 15 860
30. Samarian A A, Vaulina O S, Nefedov A P, Fortov V E, James B W and Petrov O F 2001 Phys. Rev. 64 056407
31. Courteille C, Hollenstein C, Dorier J L, Gay P, Schwarzenbach W, Howling A A, Bertran E, Viera G, Martins R and Mararico A 1996 J. Appl. Phys. 80 2069
32. Kortshagen U and Bhandarkar U 1999 Phys. Rev. E 60 887
33. Balabanov V V, Vasilyak L M, Vetchinin S P, Nefedov A P, Polyakov D N and Fortov V E 2001 JETP 92 86
34. Samsonov D and Goree J 1999 J. Vac. Sci. Technol. A 17 2835