The role of oxygen pressure and thickness on structure and pyroelectric properties of Ba (Ti0.85 Sn0.15) O3 thin films grown by pulsed laser deposition

Journal of Applied Physics

Volumn 105, Issue 8, 2009, Pages

  Wang, S J ^a   Lu, L ^a   Lai, M O ^a   Fuh, J Y H ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED THIN FILMS; BOTTOM ELECTRODES; DIELECTRIC CONSTANTS; ELECTRICAL PROPERTIES; OXYGEN PRESSURES; PYROELECTRIC COEFFICIENTS; PYROELECTRIC PROPERTIES; SI SUBSTRATES; THICKNESS DEPENDENCES;

BARIUM; BARIUM COMPOUNDS; ELECTRIC NETWORK ANALYSIS; ELECTRIC PROPERTIES; MICROSTRUCTURE; OXYGEN; PULSED LASER DEPOSITION; PYROELECTRICITY; SILICON COMPOUNDS; THIN FILMS; TIN;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 65449139034     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3097713     Document Type: Article

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