Effects of postannealing in oxygen ambient on leakage properties of (Ba, Sr)TiO3 thin-film capacitors

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 4 B, 1998, Pages

  Fukuda, Yukio ^a   Numata, Ken ^a   Aoki, Katsuhiro ^a   Nishimura, Akitoshi ^a   Fujihashi, Gaku ^a   Okamura, Soichiro ^a   Ando, Shizutoshi ^a   Tsukamoto, Takeyo ^a  

^a Texas Instruments Japan Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BARIUM COMPOUNDS; FERMI LEVEL; LEAKAGE CURRENTS; OXYGEN; PLATINUM; SPUTTER DEPOSITION; THERMAL EFFECTS; THIN FILM DEVICES;

BARIUM STRONTIUM TITANATE; SCHOTTKY BARRIER HEIGHT;

CERAMIC CAPACITORS;

EID: 0032048295     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l453     Document Type: Article

References (9)