Why is CMOS scaling coming to an END?

Proceedings - 2008 3rd International Design and Test Workshop, IDT 2008

Volumn , Issue , 2008, Pages 98-103

  Haron, Nor Zaidi ^a   Hamdioui, Said ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

CMOS; Constant field scaling; Dynamic static power; High low k materials; Lithography; Nanodevices

Indexed keywords

CMOS; CONSTANT-FIELD SCALING; DYNAMIC/STATIC POWER; HIGH/LOW-K MATERIALS; NANODEVICES;

CHARGE COUPLED DEVICES; METALLIC COMPOUNDS; MOS DEVICES; SEMICONDUCTOR INSULATOR BOUNDARIES; SEMICONDUCTOR MATERIALS; ULTRASONIC TRANSDUCERS;

NANOSTRUCTURED MATERIALS;

EID: 64849117320     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IDT.2008.4802475     Document Type: Conference Paper

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