Future of CMOS technology

IBM Journal of Research and Development

Volumn 44, Issue 3, 2000, Pages 369-378

  Isaac, Randall D ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT LAYOUT; LITHOGRAPHY; TECHNOLOGICAL FORECASTING;

TRANSISTOR SCALING;

CMOS INTEGRATED CIRCUITS;

EID: 0033723263     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.443.0369     Document Type: Article

References (11)

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