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Volumn 46, Issue 2-3, 2002, Pages 235-244

Power-constrained CMOS scaling limits

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TUNNELING; ENERGY DISSIPATION; FORMAL LOGIC; LEAKAGE CURRENTS; MOSFET DEVICES; SILICON ON INSULATOR TECHNOLOGY; VLSI CIRCUITS;

EID: 0036508274     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.462.0235     Document Type: Article
Times cited : (187)

References (25)
  • 15
    • 0027813761 scopus 로고
    • Three-dimensional 'Atomistic' simulation of discrete microscopic random dopant distributions effects in Sub-0.1 μm MOSFETs
    • (1993) IEDM Tech. Digest , pp. 705-708
    • Wong, H.-S.1    Taur, Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.