Low-temperature atomic layer-deposited TiO 2 films with low photoactivity

Journal of the American Ceramic Society

Volumn 92, Issue 3, 2009, Pages 649-654

  Liang, Xinhua ^a   King, David M ^a   Li, Peng ^b   Weimer, Alan W ^a  

^a UCB 450   (United States)

^b UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS STRUCTURES; ANATASE TIO; ATOMIC LAYERS; ATOMIC-LAYER DEPOSITIONS; CHEMICAL FUNCTIONAL GROUPS; FLUIDIZED BED REACTORS; HIGH-DENSITY POLYETHYLENES; INDUCTIVELY COUPLED PLASMA-ATOMIC EMISSION SPECTROSCOPIES; LOW TEMPERATURES; PHOTOACTIVITY; POLYMER PARTICLES; REACTION MECHANISMS; SCANNING TRANSMISSION ELECTRON MICROSCOPIES; TITANIUM TETRAISOPROPOXIDE; UNIFORM DEPOSITIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ALUMINA; ATOMIC LAYER DEPOSITION; ATOMIC SPECTROSCOPY; ATOMS; ELECTRODEPOSITION; EMISSION SPECTROSCOPY; FLUID CATALYTIC CRACKING; FLUID DYNAMICS; FLUIDIZATION; FLUIDIZED BEDS; FUNCTIONAL GROUPS; INDUCTIVELY COUPLED PLASMA; MOLECULAR SPECTROSCOPY; POLYMER FILMS; SCANNING ELECTRON MICROSCOPY; SPECTRUM ANALYSIS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 62549085999     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2009.02940.x     Document Type: Article

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