Room temperature deposition of ITO using R.F. Magnetron sputtering

Thin Solid Films

Volumn 413, Issue 1-2, 2002, Pages 181-185

  Gorjanc, T C ^a,b   Leong, D ^a,c   Py, C ^a   Roth, D ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^b UNIVERSITY OF OTTAWA   (Canada)

^c UNIVERSITY OF BRITISH COLUMBIA   (Canada)

Author keywords

Electrical properties and measurements (112); Indium tin oxide (208); Sputtering (444); Structural properties (448)

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC RESISTANCE; MAGNETRON SPUTTERING; POROSITY; SEMICONDUCTING INDIUM COMPOUNDS; SPECTRUM ANALYSIS; SPUTTER DEPOSITION; SUBSTRATES; THERMAL EFFECTS; TRANSPARENCY;

OPTICAL TRANSPARENCY STRESSES;

THIN FILMS;

EID: 0037166603     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00425-X     Document Type: Article

References (16)

1. Critical phenomena at surfaces and interfaces: Evanescent X-ray and neutron scattering