Fabrication of ITO thin films by filtered cathodic vacuum arc deposition

Materials Science and Engineering: B

Volumn 106, Issue 3, 2004, Pages 300-304

  Chen, B J ^a   Sun, X W ^a   Tay, B K ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Atomic force; Electrical properties; Filtered cathodic vacuum arc; ITO thin films; Microscopy; Transmittance

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATHODES; DEPOSITION; DOPING (ADDITIVES); OPTIMIZATION; PHOTODETECTORS; PROFILOMETRY; PULSED LASER DEPOSITION; QUARTZ; SILICON; SOLAR CELLS; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

FILTERED CATHODIC VACUUM ARC (FCVA); INDIUM-TIN-DOPED OXIDE (ITO); ITO THIN FILMS; TRANSMITTANCE; TRANSPARENT CONDUCTING OXIDES (TCO);

THIN FILMS;

EID: 1142268861     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.09.046     Document Type: Article

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