Duplication of nanoimprint templates by a novel SU-8/SiO 2/PMMA trilayer technique

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 1, 2009, Pages 19-22

  Wan, Jing ^a   Shu, Zhen ^a   Deng, Shao Ren ^a   Xie, Shen Qi ^a   Lu, Bing Rui ^a   Liu, Ran ^a   Chen, Yifang ^b   Qu, Xin Ping ^a  

^a FUDAN UNIVERSITY   (China)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; GLASS TRANSITION; NANOIMPRINT LITHOGRAPHY; OXYGEN; PHOTORESISTS; PHOTOSENSITIVE GLASS; SILICON COMPOUNDS;

ETCHING PROCESS; GLASS TRANSITION TEMPERATURES; MINIMUM FEATURE SIZES; NANO IMPRINTS; NANOIMPRINT LITHOGRAPHY PROCESS; PHOTOSENSITIVE EPOXIES; POLYMETHYLMETHACRYLATE; PROTECTIVE LAYERS; REACTIVE IONS; SU-8 RESISTS; TRANSFER LAYERS; TRILAYER;

REACTIVE ION ETCHING;

EID: 59949099342     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3039687     Document Type: Article

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