Application of nanoimprint lithography to nano-optics: Wire grid polarizer and photonic crystal LED

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6462, Issue , 2007, Pages

  Lee, Ki Dong ^a   Kim, Sang Hoon ^a   Park, Joo Do ^a   Kim, Ja Yeon ^b   Park, Seong Ju ^b  

^a LG Electronics Inc   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

Nanoimprint lithography; Photonic crystal LED; Wire grid polarizer

Indexed keywords

ENERGY GAP; NANOIMPRINT LITHOGRAPHY; OPTICAL DEVICES; PHOTONIC CRYSTALS;

LIGHT EXTRACTION; LIQUID CRYSTAL MICRODISPLAY; LOW EXTINCTION RATIO (ER); WIRE GRID POLARIZER (WPG);

LIGHT EMITTING DIODES;

LITHOGRAPHY; OPTICAL MATERIALS; PHOTODIODES;

EID: 34248652420     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.698827     Document Type: Conference Paper

References (29)

1. I. Richer, P. Sun, F, Xu, and Y. Fainman, Appl. Optics 34 2421 (1995).
2. J.D. Joannopaulos, Photonic Crystals: Modeling the Flow of Light, Princeton University Press (1995).
3. T. N. Oder, K.H. Kim, J. Y. Lin, and H. X. Jiang Appl Phys. Lett. 84, 466 (2004).
4. D.-H. Kim et al. Appl. Phys. Lett. 87, 203508 (2005)
5. H.-Y. Ryu, J.-K. Hwang, Y.-J. Lee, and Y.-H. Lee, IEEE J. Sel. Top. Quantum Electron. 8, 238 (2002).
6. H. Ichikawa and T. Baba T Appl. Phys. Lett. 84, 457 (2004).
7. T. N. Oder, J. Shakya, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 83, 1231(2003).
8. S.Y. Chou, P.R. Krauss, and P.J. Penstrom, Appl. Phys. Lett. 67, 3114 (1995).
9. S.W. Ahn, K.D. Lee, J.S. Kim, S.H. Kim, J.D. Park, S.H. Lee, and P.W. Yoon, Nanotechnology 16, 1874 (2005).
10. J. Wang, P. Sciortino, F. Liu, P. Yuan, X. Deng, F. Walters, X. Liu, J. Bacon, and L. Chen, Proc. SPIE 5931, 59310D(2005).
11. J. Wang, X. Deng, P. Sciortino, R. Varghese, A. Nikolov, F. Liu, X. Liu, and L. Chen, Proc. SPIE 5931, 59310C (2005).
12. D.H. Kim, J.G. Im, S.S. Lee, S.W. Ahn, and K.D.Lee, IEEE Photo. Technol. Lett. 17, 2352 (2005).
13. Y. Ekinici, H.H.Solak, C. David, and H. Sigg, Opt. Express 14, 2323 (2006).
14. M. Xu, H.P. Urbach, D.K.G. de Boer, and H.J. Cornelissen, Opt. Express 13,2303 (2005).
15. J.J. Wang, L. Chen, X. Liu, P. Sciorino, F. Liu, F. Walters, and X. Deng, Appl. Phys. Lett. 89, 141105 (2006).
16. B Schnabel, E. Kley, and F. Wyrowski, Opt. Eng. 38, 220 (1999).
17. J.S. Kim, K.D. Lee, S.W. Ahn, S.H. Kim, J.D. Park, S.E. Lee, and S.S. Yoon, J. Korean Phys. Soc. 45, S890 (2004).
18. Z. Yu, W. Wu, L. Chen, and S.Y. Chou, J. Vac. Sci. Technol. B 19, 2816 (2001).
19. S.W. Ahn, K.D. Lee, J.S. Kim, S.H. Kim, S.H. Lee, J.D. Park, and P.W. Yoon, Microelectron. Eng. 78-79, 314 (2005).
20. T. Nishida, H. Saito, and N. Kobayashi, Appl. Phys. Lett. 79 711 (2001).
21. P.M. Mensz, P. Kellawon, R. Van Roijen, P. Kozodoy, and S. Denbaars, Electron. Lett. 33, 2066 (1997).
22. J.K. Kim, T. Gessmann, H. Luo, and E.F. Schubert, Appl. Phys. Lett. 84 4508 (2004).
23. C. Huh, K.-S. Lee, E.-J. Kang, and S.-J. Park, J. Appl. Phys. 93 9383 (2003).
24. I. Schnitzer, E. Yablonovitch, C. Caneau, T.J. Gmitter, and A. Scherer, Appl. Phys. Lett. 63 2174 (1993).
25. R. Windisch, P. Herernans, A. Knobloch, P. Kiesel, G.H. Döhler, B. Dutta, and G. Borghs, Appl. Phys. Lett. 74 2256 (1999).
26. T. Fujii, Y. Gao, R. Sharma, E.L. Hu, S.P. DenBaars, and S. Nakamura, Appl. Phys. Lett. 84 855 (2004).
27. J. J. Wierer et al. Appl. Phys. Lett. 78 3379 (2001).
28. M. Borodisky, T.F. Krauss, R. Coccioli, R. Brijen, R. Bhat, and E. Yablonovitch, Appl. Phys. Lett. 75 1036 (1999).
29. M. Boroditsky, R. Coccioli, and E. Yablonovitch, Proc. SPIE 3283 184 (1998).