High density patterns fabricated in SU-8 by UV curing nanoimprint

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 872-876

  wang, Xudi ^a,b   Chen, Yifang ^a   Banu, Shahanara ^c   Morgan, Hywel ^c   Fu, Shaojun ^d   Cui, Zheng ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^b HEFEI UNIVERSITY OF TECHNOLOGY   (China)

^c UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^d UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CURING; NANOFLUIDICS; NANOIMPRINT LITHOGRAPHY; ULTRAVIOLET DEVICES;

CURING NANOIMPRINT; HIGH DENSITY PATTERNS;

NANOTECHNOLOGY;

PRINTING;

EID: 34247588697     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.027     Document Type: Article

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