In situ characterization of initial growth of HfO2

Applied Physics Letters

Volumn 94, Issue 3, 2009, Pages

  Wang, L ^a   Chu, Paul K ^a   Xue, K ^b   Xu, J B ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY GAP; GROWTH (MATERIALS); HAFNIUM COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; SCANNING; SCANNING PROBE MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SPECTRUM ANALYSIS; ULTRAHIGH VACUUM; VACUUM;

ATOMIC FORCES; BAND GAPS; CHEMICAL COMPOSITIONS; IN-SITU; IN-SITU CHARACTERIZATIONS; INITIAL STAGES; SCANNING PROBES; SCANNING TUNNELING SPECTROSCOPIES; SI (1 1 1); ULTRA-HIGH VACUUMS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 58849123344     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3073863     Document Type: Article

References (15)

1. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 0021-8979 10.1063/1.1361065 89, 5243 (2001).
2. J. Robertson, Eur. Phys. J.: Appl. Phys. 1286-0042 10.1051/epjap:2004206 28, 265 (2004).
3. H. Watanabe, K. Fujita, and M. Ichikawa, Appl. Phys. Lett. 0003-6951 10.1063/1.121241 72, 1987 (1998).
4. N. Miyata and M. Ichikawa, Phys. Rev. B 0163-1829 10.1103/PhysRevB.70. 073306 70, 073306 (2004).
5. J. H. Lee and M. Ichikawa, J. Appl. Phys. 91, 5661 (2002).
6. N. Miyata, H. Ota, and M. Ichikawa, Appl. Phys. Lett. 0003-6951 10.1063/1.1884750 86, 112906 (2005).
7. K. Xue, Ph.D. thesis, The Chinese University of Hong Kong, 2005.
8. O. Renault, D. Samour, J. -F. Damlencourt, D. Blin, F. Martin, S. Marthon, N. T. Barrett, and P. Besson, Appl. Phys. Lett. 0003-6951 10.1063/1.1520334 81, 3627 (2002).
9. K. Choi, H. Temkin, H. Harris, S. Gangopadhyay, L. Xie, and M. White, Appl. Phys. Lett. 0003-6951 10.1063/1.1771457 85, 215 (2004).
10. H. J. Osten, J. P. Liu, and H. J. Mussig, Appl. Phys. Lett. 0003-6951 10.1063/1.1433909 80, 297 (2002).
11. K. Bobrov, A. J. Mayne, and G. Dujardin, Nature (London) 0028-0836 10.1038/35098053 413, 616 (2001).
12. H. Watanabe, T. Baba, and M. Ichikawa, J. Appl. Phys. 0021-8979 10.1063/1.370182 85, 6704 (1999).
13. K. Xue, H. P. Ho, and J. B. Xu, J. Phys. D 0022-3727 10.1088/0022-3727/ 40/9/033 40, 2886 (2007).
14. L. Wang, K. Xue, J. B. Xu, A. P. Huang, and P. K. Chu, Appl. Phys. Lett. 0003-6951 10.1063/1.2173708 88, 072903 (2006).
15. L. Wang, P. K. Chu, A. Anders, and N. W. Cheung, J. Appl. Phys. 0021-8979 10.1063/1.2976340 104, 054117 (2008).