Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 329-337

  Sooriyakumaran, Ratnam ^a   Truong, Hoa ^a   Sundberg, Linda ^a   Morris, Mark ^a   Hinsberg, Bill ^a   Ito, Hiroshi ^a   Allen, Robert ^a   Huang, Wu Song ^b   Goldfarb, Dario ^c   Burns, Scan ^c   Pfeiffer, Dirk ^c  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM MICROELECTRONICS   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

193 nm lithography; Bilayer; e beam lithography, chemically amplified resists; Macromolecules; Molecular glasses; Molecular resists; Non polymeric; POSS; Silsesquioxanes

Indexed keywords

123 NM LITHOGRAPHY; BILAYERS; CHEMICALLY AMPLIFIED RESISTS; MOLECULAR GLASSES; MOLECULAR RESISTS; NON-POLYMERIC; POSS; SILSESQUIOXANES;

ELECTRON BEAM LITHOGRAPHY; MACROMOLECULES; MOLECULAR WEIGHT; PHOTORESISTS; SILICON COMPOUNDS;

OLIGOMERS;

EID: 24644480062     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600615     Document Type: Conference Paper

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