Enhanced Dielectric properties of SrTi O3 films with a SrRu O3 Seed by Plasma-enhanced atomic layer deposition

Electrochemical and Solid-State Letters

Volumn 12, Issue 2, 2009, Pages

  Ahn, Ji Hoon ^a   Kim, Ja Yong ^b   Kim, Jin Hyock ^b   Roh, Jae Sung ^b   Kang, Sang Won ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; CERAMIC CAPACITORS; DIELECTRIC PROPERTIES; PLASMA DEPOSITION; PLASMAS; RUTHENIUM COMPOUNDS; SEMICONDUCTING ORGANIC COMPOUNDS; THIN FILMS;

ATOMIC LAYERS; DIELECTRIC CONSTANTS; POSTANNEALING; SEED LAYERS;

OZONE WATER TREATMENT;

EID: 57649227287     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3028218     Document Type: Article

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