Increment of dielectric properties of SrTi O3 thin films by SrO interlayer on Ru bottom electrodes

Applied Physics Letters

Volumn 91, Issue 6, 2007, Pages

  Ahn, Ji Hoon ^a   Kim, Ja Yong ^a   Kang, Sang Won ^a   Kim, Jin Hyock ^b   Roh, Jae Sung ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; FILM THICKNESS; PERMITTIVITY; RUTHENIUM COMPOUNDS; STRONTIUM COMPOUNDS;

FILM CRYSTALLINITY; INTERLAYERS; POSTANNEALING; THICKNESS DEPENDENCY;

THIN FILMS;

EID: 34547829308     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2768887     Document Type: Article

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