Effect of crystallinity and nonstoichiometric region on dielectric properties of SrTi O3 films formed on Ru

Applied Physics Letters

Volumn 91, Issue 9, 2007, Pages

  Kim, Ja Yong ^a   Ahn, Ji Hoon ^a   Kang, Sang Won ^a   Kim, Jin Hyock ^b   Roh, Jae Sung ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; PERMITTIVITY; RUTHENIUM; STRONTIUM COMPOUNDS;

CRYSTALLINITY; NONSTOICHIOMETRIC REGION; OXIDE THICKNESS;

THIN FILMS;

EID: 34548450279     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2775325     Document Type: Article

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