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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 6 A, 1999, Pages 3689-3692

Thermal stability of RuO2 thin films and effects of annealing ambient on their reduction process

(4) Kaga, Yukinao a Abe, Yoshio a Kawamura, Midori a Sasaki, Katsutaka a

a KITAMI INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BINDING ENERGY; CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRODES; GRAIN SIZE AND SHAPE; REDUCTION; RUTHENIUM COMPOUNDS; SPUTTERING; THERMODYNAMIC STABILITY; THIN FILMS;

OIL DIFFUSION PUMPS; REACTIVE SPUTTERING; TURBOMOLECULAR PUMPS;

SEMICONDUCTING FILMS;

EID: 0032628111 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.38.3689 Document Type: Article

Times cited : (19)

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