Analysis of thin film polysilicon on graphite substrates deposited in a thermal CVD system

Journal of Crystal Growth

Volumn 191, Issue 3, 1998, Pages 386-392

  Angermeier, D ^a   Monna, R ^a   Slaoui, A ^a   Muller, J C ^a  

^a Faculté de Médecine   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; ELECTRIC RESISTANCE; GRAIN SIZE AND SHAPE; GRAPHITE; PHOTOCONDUCTIVITY; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

NOMARSKI MICROSCOPY;

SEMICONDUCTING FILMS;

EID: 0032119739     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)00142-0     Document Type: Article

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