In situ spectromicroscopic study of nickel induced lateral crystallization of amorphous silicon thin film using SPESM

Surface Science

Volumn 601, Issue 2, 2007, Pages 301-307

  Hong, Ie Hong ^a   Hsu, Ting Chang ^a   Yen, Shang Chieh ^a   Lin, Fu Shiang ^a   Huang, Mao Lin ^b   Chen, Chia Hao ^b  

^a NATIONAL CHIAYI UNIVERSITY   (Taiwan)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

Author keywords

Metal induced lateral crystallization; Polycrystalline silicon; Scanning photoelectron spectromicroscopy; Si 2p core level

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; NICKEL COMPOUNDS; SPECTROSCOPIC ANALYSIS;

METAL INDUCED LATERAL CRYSTALLIZATION; PATTERNED FILMS; SI 2P CORE LEVEL; VALENCE BAND;

THIN FILMS;

EID: 33846084207     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.09.038     Document Type: Article

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