메뉴 건너뛰기




Volumn 16, Issue 25, 2008, Pages 20457-20470

Optical confinement methods for continued scaling of CMOS image sensor pixels

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CROSSTALK; DIGITAL CAMERAS; EFFICIENCY; FINITE DIFFERENCE TIME DOMAIN METHOD; IMAGE SENSORS; LIGHT; PIXELS; REFRACTIVE INDEX;

EID: 57349115356     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.020457     Document Type: Article
Times cited : (56)

References (29)
  • 1
    • 21844469252 scopus 로고    scopus 로고
    • Roadmap for CMOS image sensors: Moore meets Planck and Sommerfeld
    • P. B. Catrysse, and B. A. Wandell, "Roadmap for CMOS image sensors: Moore meets Planck and Sommerfeld," Proc. SPIE 5678, 1-13 (2005).
    • (2005) Proc. SPIE , vol.5678 , pp. 1-13
    • Catrysse, P.B.1    Wandell, B.A.2
  • 3
    • 21844454738 scopus 로고    scopus 로고
    • Psychophysical thresholds and digital camera sensitivity: The thousand-photon limit
    • F. Xiao, J. E. Farrell, and B. A. Wandell, "Psychophysical thresholds and digital camera sensitivity: the thousand-photon limit," Proc. SPIE 5678, 75-84 (2005).
    • (2005) Proc. SPIE , vol.5678 , pp. 75-84
    • Xiao, F.1    Farrell, J.E.2    Wandell, B.A.3
  • 4
    • 0042905755 scopus 로고    scopus 로고
    • P. B. Catrysse, B. A. and Wandell, Optical efficiency of image sensor pixels, J. Opt. Soc. Am. A 19, 1610-1620 (2002).
    • P. B. Catrysse, B. A. and Wandell, "Optical efficiency of image sensor pixels," J. Opt. Soc. Am. A 19, 1610-1620 (2002).
  • 5
    • 0033707835 scopus 로고    scopus 로고
    • QE reduction due to pixel vignetting in CMOS image sensors
    • P. B. Catrysse, X. Liu, and A. El Gamal, "QE reduction due to pixel vignetting in CMOS image sensors," Proc. SPIE 3965, 420-430 (2000).
    • (2000) Proc. SPIE , vol.3965 , pp. 420-430
    • Catrysse, P.B.1    Liu, X.2    El Gamal, A.3
  • 6
    • 0037250349 scopus 로고    scopus 로고
    • Crosstalk and microlens study in a color CMOS image sensor
    • G. Agranov, V. Berezin, and R. H. Tsai, "Crosstalk and microlens study in a color CMOS image sensor," IEEE Trans. Electron. Dev. 50, 4-11 (2003).
    • (2003) IEEE Trans. Electron. Dev , vol.50 , pp. 4-11
    • Agranov, G.1    Berezin, V.2    Tsai, R.H.3
  • 7
    • 34248648474 scopus 로고    scopus 로고
    • C. H. Koo, H. K. Kim, K. H. Paik, D. C. Park, K. H. Lee, Y. K. Park, C. R. Moon, S. H. Lee, S. H. Hwang, and D. H. Lee, Improvement of crosstalk on 5M CMOS image sensor with 1.7 × 17 μm pixels, Proc. SPIE 6471, 15 (2007).
    • C. H. Koo, H. K. Kim, K. H. Paik, D. C. Park, K. H. Lee, Y. K. Park, C. R. Moon, S. H. Lee, S. H. Hwang, and D. H. Lee, "Improvement of crosstalk on 5M CMOS image sensor with 1.7 × 17 μm pixels," Proc. SPIE 6471, 15 (2007).
  • 8
    • 17644442831 scopus 로고    scopus 로고
    • D. N. Yaung, S. G. Wuu, H. C. Chien, T. H. Hsu, C. H. Tseng, J. S. Lin, J. J. Chen, C. H. Lo, C. Y. Yu, C. S. Tsai and C. S. Wang, Air-gap guard ring for pixel sensitivity and crosstalk improvement in deep submicron CMOS image sensor, IEEE Intl. Electron. Devices Meeting 16.5 (2003).
    • D. N. Yaung, S. G. Wuu, H. C. Chien, T. H. Hsu, C. H. Tseng, J. S. Lin, J. J. Chen, C. H. Lo, C. Y. Yu, C. S. Tsai and C. S. Wang, "Air-gap guard ring for pixel sensitivity and crosstalk improvement in deep submicron CMOS image sensor," IEEE Intl. Electron. Devices Meeting 16.5 (2003).
  • 13
    • 29344445720 scopus 로고    scopus 로고
    • Two-Dimensional Optical Simulation on a Visible Ray Passing through Inter-Metal Dielectric Layers of CMOS Image Sensor Device
    • W. G. Lee, J. S. Kim, H. J. Kim, S. Y. Kim, S. B. Hwang, and J. G. Lee, "Two-Dimensional Optical Simulation on a Visible Ray Passing through Inter-Metal Dielectric Layers of CMOS Image Sensor Device," J. Korean Phys. Soc. 47, S434-9 (2005).
    • (2005) J. Korean Phys. Soc , vol.47
    • Lee, W.G.1    Kim, J.S.2    Kim, H.J.3    Kim, S.Y.4    Hwang, S.B.5    Lee, J.G.6
  • 14
    • 33646876459 scopus 로고    scopus 로고
    • Comparison of Optical Properties in Al-and Cu-BEOL of CMOS Image Sensor Devices
    • W. G. Lee and J. S. Kim, "Comparison of Optical Properties in Al-and Cu-BEOL of CMOS Image Sensor Devices," Electrochem. Solid-State Lett. 9, G254-7 (2006).
    • (2006) Electrochem. Solid-State Lett , vol.9
    • Lee, W.G.1    Kim, J.S.2
  • 16
    • 0001417397 scopus 로고    scopus 로고
    • Optical properties of metallic films for vertical-cavity optoelectronic devices
    • A. D. Rakic, A. B. Djurisic, J. M. Elazar, and M. L. Majewski, "Optical properties of metallic films for vertical-cavity optoelectronic devices," Appl. Opt 37, 5271-5283 (1998).
    • (1998) Appl. Opt , vol.37 , pp. 5271-5283
    • Rakic, A.D.1    Djurisic, A.B.2    Elazar, J.M.3    Majewski, M.L.4
  • 17
    • 0345763698 scopus 로고    scopus 로고
    • Integrated color pixels in. 0.18-μm complementary metal oxide semiconductor technology
    • P. B. Catrysse, and B. A. Wandell, "Integrated color pixels in. 0.18-μm complementary metal oxide semiconductor technology," J. Opt. Soc. Am. A 20, 2293-2306 (2003).
    • (2003) J. Opt. Soc. Am. A , vol.20 , pp. 2293-2306
    • Catrysse, P.B.1    Wandell, B.A.2
  • 18
    • 0001640493 scopus 로고    scopus 로고
    • Characterization of a polymer microlens fabricated by use of the hydrophobic effect
    • D. M. Hartmann, O. Kibar, and S. C. Esener, "Characterization of a polymer microlens fabricated by use of the hydrophobic effect," Opt. Lett. 25, 975-977 (2000).
    • (2000) Opt. Lett , vol.25 , pp. 975-977
    • Hartmann, D.M.1    Kibar, O.2    Esener, S.C.3
  • 19
    • 0034481838 scopus 로고    scopus 로고
    • Fabrication of Micro-Optic Elements by the Sol-Gel Method
    • K. Shinmou, K. Nakama, and T. Koyama, "Fabrication of Micro-Optic Elements by the Sol-Gel Method," J. Sol-Gel Sci. and Tech. 19, 267-269 (2000).
    • (2000) J. Sol-Gel Sci. and Tech , vol.19 , pp. 267-269
    • Shinmou, K.1    Nakama, K.2    Koyama, T.3
  • 20
    • 0141830109 scopus 로고    scopus 로고
    • Hexagonal microlens array modeling and fabrication using a thermal reflow process
    • C. P. Lin, H. Yang, and C. K. Chao, "Hexagonal microlens array modeling and fabrication using a thermal reflow process," J. Micromech. Microeng. 13, 775-781 (2003).
    • (2003) J. Micromech. Microeng , vol.13 , pp. 775-781
    • Lin, C.P.1    Yang, H.2    Chao, C.K.3
  • 21
    • 17944369189 scopus 로고    scopus 로고
    • Soft-lithography-enabled fabrication of large numerical aperture refractive microlens array in hybrid SiO-TiO sol-gel glass
    • X. C. Yuan, W. X. Yu, M. He, J. Bu, W. C. Cheong, H. B. Niu, andX. Peng, "Soft-lithography-enabled fabrication of large numerical aperture refractive microlens array in hybrid SiO-TiO sol-gel glass," Appl. Phys. Lett. 86, 114102 (2005).
    • (2005) Appl. Phys. Lett , vol.86 , pp. 114102
    • Yuan, X.C.1    Yu, W.X.2    He, M.3    Bu, J.4    Cheong, W.C.5    Niu, H.B.6    andX7    Peng8
  • 23
    • 84894004646 scopus 로고    scopus 로고
    • OptiFDTD, Optiwave Systems, Inc
    • OptiFDTD, Optiwave Systems, Inc.
  • 24
    • 34247855129 scopus 로고    scopus 로고
    • Uniform illumination and rigorous electromagnetic simulations applied to CMOS image sensors
    • J. Vaillant, A. Crocherie, F. Hirigoyen, A. Cadien, and J. Pond, "Uniform illumination and rigorous electromagnetic simulations applied to CMOS image sensors," Opt. Express 15, 5494-5503 (2007).
    • (2007) Opt. Express , vol.15 , pp. 5494-5503
    • Vaillant, J.1    Crocherie, A.2    Hirigoyen, F.3    Cadien, A.4    Pond, J.5
  • 25
    • 0042045277 scopus 로고    scopus 로고
    • Pearson, San Francisco
    • E. Hecht, Optics, (Pearson, San Francisco, 2002).
    • (2002) Optics
    • Hecht, E.1
  • 26
    • 36149045375 scopus 로고
    • An experiment to measure frustrated total internal reflection
    • A. R. Afshar, and A. Thetford, "An experiment to measure frustrated total internal reflection," Eur J. Physiol. 3, 72-74 (1982).
    • (1982) Eur J. Physiol , vol.3 , pp. 72-74
    • Afshar, A.R.1    Thetford, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.