메뉴 건너뛰기




Volumn 6471, Issue , 2007, Pages

Improvement of crosstalk on 5M CMOS image sensor with 1.7×1. 7μm2 pixels

Author keywords

CMOS image sensor; Color filter; Crosstalk; Photosensitivity; Simulation

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; CROSSTALK; OPTIMIZATION; PHOTODIODES; PHOTOSENSITIVITY; PIXELS; WAVE PROPAGATION;

EID: 34248648474     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.701705     Document Type: Conference Paper
Times cited : (16)

References (7)
  • 2
    • 0001178444 scopus 로고    scopus 로고
    • CMOS active pixel image sensors fabricated using a 1.8-V, 0.25 μm CMOS technology
    • Apr
    • H. S. Wong, R. T. Chang, E. Crabbe, and P. Agnello, "CMOS active pixel image sensors fabricated using a 1.8-V, 0.25 μm CMOS technology," IEEE Trans. Electron Devices, vol. 45, pp. 889-894, Apr. 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , pp. 889-894
    • Wong, H.S.1    Chang, R.T.2    Crabbe, E.3    Agnello, P.4
  • 5
    • 0037246423 scopus 로고    scopus 로고
    • 3-D Optical and Electrical Simulation for CMOS Image Sensors
    • H. Mutoh, "3-D Optical and Electrical Simulation for CMOS Image Sensors," IEEE Trans. Electron Devices, Vol. 50, No. 1, 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.1
    • Mutoh, H.1
  • 6
    • 34248675594 scopus 로고    scopus 로고
    • C. R. Moon, et al., IEDM, p813, 2005.
    • (2005) IEDM , pp. 813
    • Moon, C.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.