Two-dimensional optical simulation on a visible ray passing through inter-metal dielectric layers of CMOS image sensor device

Journal of the Korean Physical Society

Volumn 47, Issue SUPPL. 3, 2005, Pages

  Lee, Wan Gyu ^a   Kim, Jun Seok ^a   Kim, Hee Jeen ^a   Kim, Sang Young ^a   Hwang, Sung Bo ^a   Lee, Jeong Gun ^a  

^a MagnaChip Semiconductor Ltd   (South Korea)

Author keywords

CMOS image sensor; IMD; Optical simulation

Indexed keywords

EID: 29344445720     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (11)

1. S. G. Wuu, H.-C. Chien, D.-N. Yaung, C.-H. Tseng, C. S. Wang, C.-K. Chang and Y.-K. Hsaio, IEDM Tech. Dig. (Washington DC, 2001), p. 555.
2. J.-H. Park, S.-H. Seo and I.-S. Wang, J. Korean Phys. Soc. 44, 157 (2004).
3. |3] K. Yoon, C. Kim, B. Lee and D. Lee, Proc. Solid-State Circuits Conf. Dig. 1, 36 (2002).
4. H.-S. P. Wong, R. T. Chang, E. Crabbe and P. D. Agnello, IEEE Trans. Electron Devices. 45, 889 (1998).
5. T. H. Hsu, Y. K. Fang, D. N. Yaung, S. G. Wuu, H. C. Chien, C. S. Wang, J. S. Lin, C. H. Tseng, S. F. Chen, C. S. Lin and C. Y. Lin, IEEE Electron Device Letters. 25, 375 (2004).
6. D.-N. Yaung, S.-G. Wuu, Y.-K. Fang, C. S. Wang, C.-H. Tseng and M.-S. Liang, IEEE Electron Device Letters. 22, 71 (2001).
7. X. Zhang and K. K. Mei, IEEE Transactions on Microwave Theory and Technique 36, 1775 (1988).
8. H. J. Yoon and D. I. Kim, J. Korean Phys. Soc. 45, 1025 (2004).
9. D. K. Schroder, IEEE Trans. Electron Devices ED-19, 1018 (1972).
10. S.-Y. Lee and D. K. Schroder, IEEE Trans. Electron Devices 46, 1016 (1999).
11. K. Rajkanam, R. Singh and J. Shewchum, Solid-State Electronics 22, 793 (1979).