Scanning thermal microscopy and Raman analysis of bulk fused silica exposed to low-energy femtosecond laser pulses

Optics Express

Volumn 16, Issue 24, 2008, Pages 19520-19534

  Bellouard, Y ^a   Barthel, E ^b   Said, A A ^c   Dugan, M ^c   Bado, P ^c  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b SAINT GOBAIN RECHERCHE   (France)

^c TRANSLUME INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FUSED SILICA; HYDROFLUORIC ACID; LASER PULSES; REFRACTIVE INDEX; SILICA; THERMAL CONDUCTIVITY; ULTRAFAST LASERS;

DIRECT-WRITE METHODS; LASER POLARIZATION; PERIODIC PATTERN; PHYSICAL MECHANISM; RAMAN SPECTROMETERS; SCANNING THERMAL MICROSCOPE; SCANNING THERMAL MICROSCOPY; THEORETICAL VALUES;

ULTRASHORT PULSES;

EID: 56749098349     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.019520     Document Type: Article

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