Fabrication of high-aspect ratio, micro-fluidic channels and tunnels using femtosecond laser pulses and chemical etching

Optics Express

Volumn 12, Issue 10, 2004, Pages 2120-2129

  Bellouard, Yves ^a   Said, Ali ^b   Dugan, Mark ^b   Bado, Philippe ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b TRANSLUME INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FUSED SILICA; LASER PULSES; RADIATION EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICA; SUBSTRATES; TUNNELS; VOLUME CONTROL (SPATIAL);

CHEMICAL ETCHING; FEMTOSECOND; FUSED SILICA GLASS; MICRO-FLUIDIC CHANNELS;

FABRICATION;

EID: 2942731788     PISSN: 10944087     EISSN: None     Source Type: Journal    
DOI: 10.1364/OPEX.12.002120     Document Type: Article

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