Integrated metrology: An enabler for advanced process control (APC)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4406, Issue , 2001, Pages 118-130

  Schneider, C ^a   Pfitzner, L ^a   Ryssel, H ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

Author keywords

300 mm technology; Advanced process control; Fault detection; In situ measurement; Integrated metrology; Run to run control; Semiconductor manufacturing equipment

Indexed keywords

COST EFFECTIVENESS; FAILURE ANALYSIS; MICROELECTRONIC PROCESSING; SEMICONDUCTOR DEVICE MANUFACTURE; SENSORS; STATISTICAL METHODS; WSI CIRCUITS;

ADVANCED PROCESS CONTROL (APC);

PROCESS CONTROL;

EID: 0034839160     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425280     Document Type: Conference Paper

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