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Volumn 12, Issue 4, 1999, Pages 493-502

Feedforward control for reduced run-to-run variation in microelectronics manufacturing

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; GRAPHICAL USER INTERFACES; INTERACTIVE COMPUTER GRAPHICS;

EID: 0033324213     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.806127     Document Type: Article
Times cited : (26)

References (16)
  • 2
    • 21844508316 scopus 로고
    • Real-time feedback for sidewall profile control in reactive ion etching
    • May/June
    • B. Rashap, J. Freudenberg, and M. Elta, "Real-time feedback for sidewall profile control in reactive ion etching," J. Vac. Sci. Technol. A, vol. 13, pp. 1792-1796, May/June 1995.
    • (1995) J. Vac. Sci. Technol. A , vol.13 , pp. 1792-1796
    • Rashap, B.1    Freudenberg, J.2    Elta, M.3
  • 5
    • 0028601917 scopus 로고
    • Application of feed-forward and adaptive feedback control to semiconductor device manufacturing
    • June
    • K. Stoddard, P. Crouch, M. Kozicki, and K. Tsakalis, "Application of feed-forward and adaptive feedback control to semiconductor device manufacturing," in Proc. American Control Conf., June 1994, pp. 892-896.
    • (1994) Proc. American Control Conf. , pp. 892-896
    • Stoddard, K.1    Crouch, P.2    Kozicki, M.3    Tsakalis, K.4
  • 7
    • 0030707281 scopus 로고    scopus 로고
    • Multi step process yield control with large system models
    • E. Rietman, "Multi step process yield control with large system models," in Proc. 1997 American Control Conf., pp. 1573-1574.
    • Proc. 1997 American Control Conf. , pp. 1573-1574
    • Rietman, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.